| Review: |
This book is for those who use vacuum technology in chemical applications and who are involved in the design and operation of such equipment. The authors begin by laying out the scientific principles behind vacuum technology and gas flow. They then go on to review the range of pumps available and the combinations to use over the pressure range from atmospheric down to the EHV range. The gas sources and loads and their influence on the attainable pressure are both considered. Method of measuring both total and partial pressure in vacuum systems and the choice of gauge are all discussed. In the last chapters the author looks at the most important applications in chemical sciences: in chemical technology, for drying and distillation; the use of UHV/EHV systems, e.g. in surface science and research into synchrotron radiation sources; and the use of differential pumping to create large pressure differences within systems. |