Handbook of Thin Film Deposition. Processes and Technologies
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Author(s): K. Seshan (Ed.)
Publisher: IHS American Technical Publishers
ISBN: 0815514425
Format: hardback
629pp
Price: £106.00
Review Date: 04 February 2002
Review: This edition traces the technology behind the growth of the silicon semiconductor industry and its continued trend in miniaturization over the last twenty years. This growth has been largely fuelled by improved thin-film deposition techniques and the development of specialized equipment for handling thin films. There are chapters on: deposition technologies and applications; silicon epitaxy by vapour deposition; chemical vapour deposition of silicon dioxide films; metal organic chemical vapour deposition technology and equipment; feature scale modelling; the role of metrology and inspection in semiconductor processing; sputtering and sputter techniques; laser and electron-beam assisted processing; molecular beam epitaxy equipment and practice; ion-beam deposition; chemical mechanical polishing; organic dielectrics in multilevel metallization of integrated circuits, and performance, processing and lithography trends.